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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

By

Julissa Green
Aluminum titanium sputtering target
Aluminum titanium alloy Aluminum titanium alloy is a kind of metal material with high die-casting yield, high density, high strength and flexibility. The difference between aluminum titanium alloy and titanium aluminum alloy is the proportion of these two elements. The element appears earlier has a larger proportion. Aluminum titanium alloy usually contains 0.50 to 1.20%...
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AlN semiconductor wafer
Development of Semiconductor Materials 1 The first generation of semiconductor: represented by Si, Ge semiconductor materials; 2 The second generation of semiconductor: represented by GaAs, InP semiconductor materials; 3 The third generation of semiconductor: represented by several wide-bandgap semiconductor materials such as silicon carbide (SiC), gallium nitride (GaN), zinc oxide (ZnO), diamond, and aluminum nitride...
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different target shapes
Almost all new sputter deposition equipment uses a powerful magnet to spiral the electrons to accelerate the ionization of the argon around the target, resulting in an increased probability of collision between the sputtering target and the argon ions, and thus the sputtering rate is increased. Generally, most metal films uses DC sputtering, while non-conductive...
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Aluminum Scandium alloy
What is Aluminum Scandium alloy? Aluminum Scandium alloy is a kind of high-performance aluminum alloy. There are several ways to improve the performance of aluminum alloy. In the past 20 years, micro-alloying and toughening is the frontier of high-performance aluminum alloy research. Features Adding a small amount of scandium to the aluminum alloy can promote...
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titanium connecting rod
Titanium alloys have been widely used in the aerospace industry. However, in recent years, although the aerospace industry is still the biggest market, the research and development direction of titanium alloys has shifted from the aerospace industry to the civilian industry. Titanium alloys applied for aerospace industry tend to have excellent performance but are EXPENSIVE....
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cold pressing
Previously, we have introduced Four main molding methods for ITO targets, mainly about their definitions and characteristics. And today I think it necessary to talk about the advantages and disadvantages of each method, which is helpful for you to make choices between them when you want to prepare ITO targets. Hot Pressing The hot pressing...
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Zn powder
How to use ZnO or Zn powder to make a large diameter sputtering target? If you want to make a sputtering target by using ZnO or Zn powder, you have to know the following points. How to make a sputtering target? There are two main ways to make a sputtering target. One is casting. The...
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Targets
Well, the question “what is the sputtering target” may seem stupid for insiders. But undoubtedly it is the most basic question in the relevant industry. Search this question in Google, you may find 3,770,000 results, which is quite a HUGE number! Just compare it with 4,510,000 results of searching “sputtering target”. (data may differ) So...
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ITO film
In recent years, with the development of large size flat panel displays, the requirements for the size and density of ITO targets have become higher and higher, and the hot pressing equipment and technology are far from meeting the requirements. Therefore, the production of large-size, high-density ITO targets by sintering has become the focus of...
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