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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

By

Julissa Green
Common Defects in Physical Vapor Deposition
Due to their excellent wear resistance, heat resistance and other properties, PVD coatings are widely used in various industries. However, the defects of the coating make it impossible to demonstrate all of its advantages. If you want to solve the defects in PVD coating, you must know these defects, at least you should know – what...
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scandium-rare-earth-element- and-application
If there is a metal that is ignored by us, I think that is scandium. Scandium is found in most rare earth elements and uranium deposits, but it can only be extracted from a few mines around the world. Due to the low availability and difficulty in preparation, which was succeeded in 1937, of scandium,...
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an-overview-of-sputtering-deposition
What is Sputtering Deposition? Sputtering deposition, or sputter coating, is one of the physical vapor deposition technology, whereby particles are ejected from a solid target material due to the bombardment of the target by energetic particles. It is an electronic process that deposits thin films of metals or other materials onto a variety of surfaces. Most often,...
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Silver Film Deposition on Glass Surface
The case A well-known industrial glass company—-We attempted to deposit a silver film about one micron thick on the glass substrate using silver evaporation materials by vacuum evaporation. And our existing coating facilities are limited that we can only use electron beam evaporation. We tried Ag / Ti glass in the beginning, but the silver...
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The sputtering target is an important material for physical vapor deposition, the most widely used technology for depositing materials. As its name suggests, “physical” means that the PVD coating method involves a purely physical process. During the physical vapor deposition, a solid target material is broken up into the vapor state (usually in a high...
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3 Factors Affecting the Deposition Rate in Magnetron Sputtering
Magnetron sputtering is a physical vapor deposition method that allows the deposition of various materials, including metals, oxides, ceramics and etc. by using a specially formed magnetic field applied to a diode sputtering target. The deposition rate, or the film formation rate, is an important parameter that measures the effectiveness of the magnetron sputtering machine....
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The yttrium oxide dielectric film refers to a thin film material as a dielectric, which is an important component and ideal material of a hybrid integrated circuit used in the electronics industry. Yttrium Oxide Dielectric Film Properties Y2O3 is a white powder with a crystal structure of body-centered cubic. Yttrium Oxide Dielectric Film has good...
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Aluminum Scandium Sputter Target Introduction
Introduction Sputtering targets are essential materials used in the deposition of thin films through a process known as sputtering, a cornerstone technique in semiconductor manufacturing and surface coating technologies. Aluminum scandium sputtering targets, consisting of an aluminum alloy with scandium, represent a significant advancement in this field. The addition of scandium to aluminum not only...
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The Semiconductor Market: Opportunities and Threats From both of the perspective of technology or economic development, the importance of semiconductors is enormous. Most of today’s electronic products, such as computers, mobile phones or digital recorders, have a very close relationship with semiconductors. Along with the rapid development, the semiconductor market also faces some challenges. First,...
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