Chemical Formula: Ti/Al/V
Catalog Number: ST0114
CAS Number: 7440-32-6 | 7429
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The titanium aluminum vanadium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality titanium aluminum vanadium sputter targets at the most competitive prices.
Titanium aluminum vanadium sputtering target from Stanford Advanced Materials is an alloy sputtering material containing Ti, Al and V.
Titanium is a chemical element that originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor. The isolation was later accomplished and announced by J. Berzelius. “Ti” is the canonical chemical symbol of titanium. Its atomic number in the periodic table of elements is 22 with a location at Period 4 and Group 4, belonging to the d-block. The relative atomic mass of titanium is 47.867(1) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Titanium (Ti) Sputtering Target
Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaning bitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Aluminum (Al) Sputtering Target
Vanadium is a chemical element that originated from Vanadis, an old Norse name for the Scandinavian goddess Freyja. It was first mentioned in 1801 and observed by M. del RÃo. The isolation was later accomplished and announced by N.G.Sefström. “V” is the canonical chemical symbol of vanadium. Its atomic number in the periodic table of elements is 23 with location at Period 4 and Group 5, belonging to the d-block. The relative atomic mass of vanadium is 50.9415(1) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Vanadium (V) Sputtering Target
Our titanium aluminum vanadium sputter targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High-quality titanium aluminum vanadium sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.
