(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0508 Silicon Chromium Sputtering Target, Si/Cr

Chemical Formula: Si/Cr
Catalog Number: ST0508
Purity: 99%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

SAM’s Silicon Chromium Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.




Description

Silicon Chromium Sputtering Target Description

Unlock the potential of Silicon Chromium Sputtering Targets and explore their diverse applications across various industries. This page provides insights into the key characteristics and applications of integrating Silicon Chromium into thin film deposition processes.

Elemental Combination: Silicon and Chromium

Silicon, derived from the Latin ‘silex’ or ‘silicis’ meaning flint, is a vital chemical element. Isolated and announced by J. Berzelius, silicon holds the chemical symbol “Si” with an atomic number of 14. Its atomic mass is 28.0855(3) Dalton, denoting the uncertainty.

Chromium, a silvery-white, soft, non-magnetic, and ductile metal, resides within the boron group. It exists in over 270 minerals and contributes to reflective coatings on telescopes, automotive components, and more. The aerospace, automotive lighting, OLED, and optical industries extensively employ it.

Related Products: Silicon Sputtering TargetChromium Sputtering Target.

Silicon Chromium Sputtering Target Specifications

Specification Details
Material Type Silicon Chromium
Symbol Si/Cr
Color/Appearance Metallic solid in various forms including powder, sputtering target, foil, bar, plate
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ <br> Thick: 0.125″, 0.250″ <br> Custom shapes and sizes available on inquiry.
Packing Targets are tagged and labeled externally for identification and quality control. Careful handling during storage and transportation.

Silicon Chromium Sputtering Target Applications

  1. Thin Film Deposition: Silicon Chromium sputtering targets are essential in producing thin films for various applications in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) for displays and optics.
  2. Coating Creation: Silicon Chromium contributes to the formation of reflective coatings on automotive headlamps, mirrors, and telescopes, enhancing their performance.
  3. Innovative Industries: The aerospace, automotive lighting, OLED, and optical industries harness the unique properties of Silicon Chromium for cutting-edge technologies.

Silicon Chromium Sputtering Target Advantages

  • Enhanced Efficiency: The properties of Silicon Chromium sputtering targets contribute to efficient thin film deposition processes, optimizing performance in various industries.
  • Versatile Coatings: The reflective coatings formed using Silicon Chromium enhance the quality and functionality of a wide range of products, from automotive components to telescopes.
  • Cutting-Edge Technology: Silicon Chromium’s role in innovative industries ensures its presence in the forefront of technological advancements.

Leverage the potential of Silicon Chromium Sputtering Targets and harness their exceptional properties for innovative applications across industries. Contact us today for inquiries and customized solutions.

Submit your review
1
2
3
4
5
Submit
     
Cancel

Create your own review

Silicon Chromium Sputtering Target, Si/Cr
Average rating:  
 1 reviews
by Randy Moore on Silicon Chromium Sputtering Target, Si/Cr

Good value, fast shipping, tight package. As described.