(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0500 Osmium Rubidium Sputtering Target, Os/Ru

Chemical Formula: Os/Ru
Catalog Number: ST0500
Purity: 99%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

At SAM, we provide a range of Osmium Rubidium Sputter Targets in different forms, purities, sizes, and prices. Our expertise lies in producing high-purity physical vapor deposition materials, optimized for use in semiconductor, chemical vapor deposition, and physical vapor deposition applications in displays and optics. If you require further information or have specific inquiries, feel free to contact us.




Description

Osmium Rubidium Sputtering Target Description

OsmiumOsmium is a chemical element with the symbol Os and atomic number 76. It is a hard, brittle, bluish-white transition metal in the platinum group that is found as a trace element in alloys, mostly in platinum ores. Osmium is the densest naturally occurring element, with an experimentally measured (using x-ray crystallography) density of 22.59 g/cm3. Manufacturers use its alloys with platinum, iridium, and other platinum-group metals to make fountain pen nib tipping, electrical contacts, and in other applications that require extreme durability and hardness. The element’s abundance in the Earth’s crust is among the rarest

Rubidium Rubidium is a chemical element with the symbol Rb and atomic number 37. It is a very soft, silvery-white metal in the alkali metal group. Rubidium metal shares similarities to potassium metal and cesium metal in physical appearance, softness and conductivity. Rubidium cannot be stored under atmospheric oxygen, as a

Related Products: Osmium Sputtering TargetRubidium Sputtering Target.

Osmium Rubidium Sputtering Target Specification

Material Type Osmium Rubidium
Symbol Os/Ru
Color/Appearance Solid
Melting Point /
Density /
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Osmium Rubidium Sputtering Target Application

Osmium Rubidium Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packing

Our Osmium Rubidium Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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Osmium Rubidium Sputtering Target, Os/Ru
Average rating:  
 1 reviews
by Todd Walker on Osmium Rubidium Sputtering Target, Os/Ru

Great deal, will buy again