Chemical Formula: Ni/Cr/Al
Catalog Number: ST0100
CAS Number: 7440-02-0 | 7440
Purity: 99.9%, 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The nickel chromium aluminum sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality nickel chromium aluminum sputter targets at the most competitive prices.
The nickel chromium aluminum sputtering target from Stanford Advanced Materials is an alloy sputtering material containing Ni, Cr and Al.
Nickel is a chemical element that originated from the shortened of the German ‘kupfernickel’ meaning either devil’s copper or St. Nicholas’s copper. It was first mentioned in 1751 and observed by F. Cronstedt. The isolation was later accomplished and announced by F. Cronstedt. “Ni” is the canonical chemical symbol of nickel. Its atomic number in the periodic table of elements is 28 with a location at Period 4 and Group 10, belonging to the d-block. The relative atomic mass of nickel is 58.6934(2) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Nickel Sputtering Target
Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Chromium Sputtering Target
Aluminium, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminium. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminium is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Aluminium Sputtering Target
The nickel chromium aluminum sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our nickel chromium aluminum sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
High-quality nickel chromium aluminum sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.
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I bought these for chemistry class to do some film coating experiments with. They function properly for what we use them for.
