Chemical Formula: Au/Pt
Catalog Number: ST0528
Purity: 99.9%, 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Gold platinum sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality gold platinum sputter targets at the most competitive price.
Gold platinum sputtering targets are fabricated by combining high-purity gold and platinum materials to create a homogeneous alloy. These targets are carefully machined into specific shapes suitable for sputtering. The alloy composition can be tailored to meet desired properties, such as specific electrical conductivity, corrosion resistance, or other characteristics.
Related Products: Gold Sputtering Targets, Platinum Sputtering Targets.
| Material Type | Gold Platinum |
| Symbol | Au/Pt |
| Color/Appearance | Solid |
| Molecular Weight | 392.05 |
| Monoisotopic Mass | 391.931 g/mol |
| Melting Point | Varies based on alloy composition, typically above 1,000°C (1,832°F) |
| Available Sizes | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Other alloy compositions, shapes, sizes, and purity customization are available.
Gold-platinum alloy sputtering targets are used in a range of applications, particularly in the electronics and sensor industries. These alloys offer a unique combination of properties, including excellent electrical conductivity, resistance to corrosion, and biocompatibility. They are employed to deposit thin films of gold-platinum alloys on substrates for applications such as electrical contacts, biosensors, and electrode materials in a variety of devices.
Our metal alloy gold platinum sputter coater targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
The high-quality gold platinum sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high-purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
Submit your review | |
Fast shipping. The product is exactly as described.
