Cornerstone Articles

The sputtering target is a new type of coating material (compared to evaporation materials) that is critical for thin-film solar cell coatings in the solar industry. Solar cell thin-film coating A thin-film solar cell is a second-generation solar cell that is made by depositing one or more thin layers, or thin film (TF) of photovoltaic...Continue Reading

The crucible is an important vessel for scientific experiments as well as industrial productions. It is a pot that is used to keep metals for melting in a furnace. So furnace crucibles are usually designed to withstand the highest temperatures encountered in the metal casting works, which means the crucible should essentially be made of...Continue Reading

An Overview of Magnetron Sputtering Magnetron sputtering, a physical vapor deposition (PVD) process, is a main thin film deposition method for manufacturing semiconductors, disk drives, CDs, and optical devices. Magnetron sputtering has the advantages of high speed, low temperature, and low damage. In this article, let’s take a look at the definition, working principle, and...Continue Reading

What are the Three Generations of Semiconductor Materials? The first generation of semiconductor material The first generation of semiconductor materials mainly refers to silicon (Si) and germanium (Ge) materials. In the 1950s, Ge dominated the semiconductor market and was mainly used in low-voltage, low-frequency, medium-power transistors and photodetectors. However, Ge semiconductor devices were inferior in...Continue Reading

The sputtering target refers to the sputtering source that is deposited on a substrate to form various functional films under appropriate process conditions. Sputtering targets are widely used in many fields such as decoration, tooling, glass, electronic devices, semiconductors, and solar cells. Sputtering targets required in different fields vary. They can be classified into pure...Continue Reading

Happy new year, my dear friends. We are very happy with your company and encouragement. SAM Sputter Target’s website has not been established for a long time, but we always insist on updating the news and knowledge about targets and coatings every week. On the occasion of the arrival of 2019, let us summarize the...Continue Reading

Introduction In this article, we will explore the unique properties and applications of pyrolytic boron nitride (PBN). Also known as Chemical Vapor-Deposited Boron Nitride (CVD-BN), PBN is a remarkable material that finds use in various industries. Let’s delve into the characteristics and uses of both PBN and its related form, hexagonal boron nitride (hBN). Pyrolytic Boron Nitride...Continue Reading

Introduction Vacuum evaporation is a process in which a solid material (referred to as the evaporating material) is heated in a high vacuum environment to be deposited on a specific substrate to obtain a film. The vacuum evaporation process is mainly used in microelectronics to make active components, device contacts, and metal interconnections, high precision...Continue Reading

You may be familiar with aluminum but unfamiliar with aluminum sputter targets. But to some extent, they are the same, consisting of atom Al. In a word, the aluminum sputtering target can be considered a product after a series of processes from high-purity aluminum. Aluminum target is a type of sputtering material used mounted on a vacuum...Continue Reading

Definition of ITO Sputtering Target The full name of ITO is indium tin oxide, a composition of indium, tin, and oxygen with different proportions. The substance of ITO and ITO sputtering target is the same, the latter of which is actually a black-gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in...Continue Reading