(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0283 Manganese Sulfide Sputtering Target, MnS

Chemical Formula: MnS
Catalog Number: ST0283
CAS Number: 18820-29-6
Purity: >99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Manganese sulfide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality MnS sputtering targets at the most competitive price.




Description

Manganese Sulfide Sputtering Target Description

Manganese sulfide sputtering target is a type of sulfide ceramic sputtering target composed of manganese and sulfur.

manganeseManganese is a chemical element originated from Either the Latin ‘magnes’, meaning magnet or from the black magnesium oxide, ‘magnesia nigra’. It was first mentioned in 1770 and observed by O. Bergman. The isolation was later accomplished and announced by G. Gahn. “Mn” is the canonical chemical symbol of manganese. Its atomic number in the periodic table of elements is 25 with location at Period 4 and Group 7, belonging to the d-block. The relative atomic mass of manganese is 54.938045(5) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Manganese Sputtering Target

SulfurSulfur, also called sulphur, is a chemical element originated from Either from the Sanskrit ‘sulvere’, or the Latin ‘sulfurium’, both names for sulfur. It was early used before 2000 BC and discovered by Chinese and Indians. “S” is the canonical chemical symbol of sulfur. Its atomic number in the periodic table of elements is 16 with location at Period 3 and Group 16, belonging to the p-block. The relative atomic mass of sulfur is 32.065(5) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Sulfide Ceramic Sputtering Target

Manganese Sulfide Sputtering Target Specification

Compound Formula MnS
Appearance Solid
Melting Point 449.85 °C
Density 3.3-3.99 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Manganese Sulfide Sputtering Target Application

The manganese sulfide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Manganese Sulfide Sputtering Target Packing

Our manganese sulfide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s manganese sulfide sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.

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Manganese Sulfide Sputtering Target, MnS
Average rating:  
 1 reviews
by Greg Newton on Manganese Sulfide Sputtering Target, MnS

great price & quality. Will buy it again.