(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0270 Zirconium Silicide Sputtering Target, ZrSi2

Chemical Formula: ZrSi2
Catalog Number: ST0270
CAS Number: 12039-90-6
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Zirconium silicide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality ZrSi2 sputtering targets at the most competitive price.

Zirconium Silicide MSDS File




Description

Zirconium Silicide Sputtering Target Description

Zirconium silicide sputtering target is a type of silicide ceramic sputtering target composed of zirconium and silicon.

ZirconiumZirconium is a chemical element originated from the Persian ‘zargun’, meaning gold coloured. It was first mentioned in 1789 and observed by H. Klaproth. The isolation was later accomplished and announced by J. Berzelius. “Zr” is the canonical chemical symbol of zirconium. Its atomic number in the periodic table of elements is 40 with location at Period 5 and Group 4, belonging to the d-block. The relative atomic mass of zirconium is 91.224(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Zirconium Sputtering Target

SiliconSilicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Silicide Ceramic Sputtering Target

Zirconium Silicide Sputtering Target Specification

Compound Formula ZrSi2
Molecular Weight 147.4
Appearance Gray Target
Density 4.88 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Zirconium Silicide Sputtering Target Application

The zirconium silicide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Zirconium Silicide Sputtering Target Packing

Our zirconium silicide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s zirconium silicide sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.

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Zirconium Silicide Sputtering Target, ZrSi2
Average rating:  
 1 reviews
by Thomas Brown on Zirconium Silicide Sputtering Target, ZrSi2

Five Stars. Great product for the price! Easy to use.