ST0185 Silicon Dioxide Sputtering Target, SiO2

Silicon Dioxide Sputtering Target Description

Silicon dioxide sputtering target from Stanford Advanced Materials contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: silicon (Si) and oxygen (O2). Silica is most commonly considered to be in the form of quartz. It exists naturally in water, plants, animals and the earth. 59% of the earth’s crust is composed of silicon dioxide. In addition, it also forms more than 95% of the known rocks on Earth. Here is the structure of SiO2.

Silicon Dioxide Sputtering Target Specification

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Silicon Dioxide Sputtering Target Bonding Service

Indium Bonding and Elastomeric Target Bonding Service are available for silicon dioxide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Silicon Dioxide Sputtering Target Packaging

Our silicon oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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High quality silicon dioxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.