ST0154 Indium Tin Oxide Sputtering Target, In2O3/SnO2

Indium Tin Oxide Sputtering Target Description

Indium tin oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing In, Sn and O.

Indium is a chemical element that originated from the Latin ‘indicium’, meaning violet or indigo. It was first mentioned in 1863 and observed by F. Reich and T. Richter. The isolation was later accomplished and announced by T. Richter. “In” is the canonical chemical symbol of indium. Its atomic number in the periodic table of elements is 49 with a location at Period 5 and Group 13, belonging to the p-block. The relative atomic mass of indium is 114.818(3) Dalton, the number in the brackets indicating the uncertainty. Indium compounds are evaporated under vacuum to form thin films in the production of electronics and photovoltaic cells. Pure indium is utilized as a film layer in semiconductors.

Related Product: Indium (In) Sputtering Target

Tin, also called stannum, is a chemical element that originated from the Anglo-Saxon word tin (stannum in Latin, meaning hard). It was early used in 3500 BC. “Sn” is the canonical chemical symbol of tin. Its atomic number in the periodic table of elements is 50 with a location at Period 5 and Group 14, belonging to the p-block. The relative atomic mass of tin is 118.710(7) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Tin (Sn) Sputtering Target

Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Oxide Ceramic Sputtering Target

Indium Tin Oxide Sputtering Target Application

The indium tin oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Indium Tin Oxide Sputtering Target Packing

Our indium tin oxide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

High-quality indium tin oxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.