Chemical Formula:CaRuO3
Catalog Number: ST0337
CAS Number:
Purity:99.90%
Shape:Discs, Plates, Step Targets, Custom-made
Calcium ruthenate sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is a trusted sputtering target supplier working with international partners to bring you the highest quality products with the most affordable pricing.
Calcium is a chemical element originated from the Latin ‘calx’ meaning lime. It was first mentioned in 1808 and observed by H. Davy. The isolation was later accomplished and announced by H. Davy. “Ca” is the canonical chemical symbol of calcium. Its atomic number in the periodic table of elements is 20 with location at Period 4 and Group 2, belonging to the s-block. The relative atomic mass of calcium is 40.078(4) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Calcium Sputtering Target
Ruthenium is a chemical element originated from Russia (with the Latin name Ruthenia). It was first mentioned in 1807 and observed by J. Sniadecki. The isolation was later accomplished and announced by J. Sniadecki. “Ru” is the canonical chemical symbol of ruthenium. Its atomic number in the periodic table of elements is 44 with location at Period 5 and Group 8, belonging to the d-block. The relative atomic mass of ruthenium is 101.07(2) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Ruthenium Sputtering Target
The calcium ruthenate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our calcium ruthenate sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s calcium ruthenate sputtering targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
