(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0088 Copper Indium Sputtering Target, Cu/In

Chemical Formula: Cu/In
Catalog Number: ST0088
CAS Number: 7440-50-8 | 7440
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The copper indium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality copper indium sputter targets at the most competitive prices.




Description

Copper Indium Sputtering Target Description

The copper indium sputtering target from Stanford Advanced Materials is an alloy sputtering material containing Cu and In.

CopperCopper is a chemical element originated from the Old English name coper in turn derived from the Latin ‘Cyprium aes’, meaning a metal from Cyprus. It was early used in 9000 BC and discovered by people from the Middle East. “Cu” is the canonical chemical symbol of copper. Its atomic number in the periodic table of elements is 29 with a location at Period 4 and Group 11, belonging to the d-block. The relative atomic mass of copper is 63.546(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Copper Sputtering Target

IndiumIndium is a chemical element originated from the Latin ‘indicium’, meaning violet or indigo. It was first mentioned in 1863 and observed by F. Reich and T. Richter. The isolation was later accomplished and announced by T. Richter. “In” is the canonical chemical symbol of indium. Its atomic number in the periodic table of elements is 49 with location at Period 5 and Group 13, belonging to the p-block. The relative atomic mass of indium is 114.818(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Indium Sputtering Target

Copper Indium Sputtering Target Specification

Compound Formula CuIn
Molecular Weight 178.364
Appearance Gray metallic target
Melting Point 540~640 °C

Copper Indium Sputtering Target Application

The copper indium sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Copper Indium Sputtering Target Packing

Our copper indium sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

High-quality copper indium sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.